Terminal absolute filter element for photoresist
Terminal absolute filter element for photoresist is specially designed for filtering photoresist. It adopts high flow rate, high-precision PTFE or nylon filter membrane, combined with low precipitation HDPE framework, with extremely low dissolution, and is suitable for terminal filtration of photoresist. It can select a variety of filtration precision from 0.02 to 10 μ m, which can meet different filtration requirements. It can be customized according to the application and customer needs.
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Filter element with ultra-high carrying capacity
The filter element with ultra-high carrying capacity is made of multi-layer nano-fiber material, which has high carrying capacity for pollutants under reasonable gradient structure design. The characteristic of multi-stage interception of the gradient aperture from coarse to fine makes the filter element have stronger carrying capacity, and be able to effectively improve the problem of fast surface clogging, which greatly prolongs the service life of the filter element. The filtration precision of 0.5-90μm can meet the requirements of different filtration precision, and it is very suitable for filtration of high suspended particles, colloidal substances and high viscosity liquid.
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